An article Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography WOS:000529924800041 published article about NANOPARTICLE PHOTORESISTS; ORGANIC FRAMEWORK; DESIGN in [Kumar, Rudra; Chauhan, Manvendra; Moinuddin, Mohamad G.; Sharma, Satinder K.] Indian Inst Technol IIT Mandi, Sch Comp & Elect Engn SCEE, Mandi 175005, Himachal Prades, India; [Gonsalves, Kenneth E.] Indian Inst Technol IIT Mandi, Sch Basic Sci SBS, Mandi 175005, Himachal Prades, India in 2020.0, Cited 61.0. Recommanded Product: 3-Methylbenzoic acid. The Name is 3-Methylbenzoic acid. Through research, I have a further understanding and discovery of 99-04-7
Hybrid metal-organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to their ability for patterning down to similar to 10 nm or below. High-resolution resist patterning is integrally associated with the compatibility of the resist and irradiation of the exposure source. Helium ion beam lithography (HIBL) is an emerging approach for the realization of sub-10 nm patterns at considerably lower line edge/width roughness (LER/LWR) and higher sensitivity as compared to electron beam lithography (EBL). Here, for the first time, a negative tone resist incorporating nickel (NO-based metal-organic clusters (Ni-MOCs) was synthesized and patterned using HIBL and EBL at 30 keV. This resist comprises a nickel-based metal building unit covalently linked with the organic ligand: m-toluic acid (C8H8O2). Dynamic light scattering confirmed a narrow size distribution of similar to 2 nm for metal-organic cluster (MOC) formulations. High-resolution similar to 9 nm HIBL line patterns were well developed at a sensitivity of 22 mu C/cm(2) and at a significantly low LER and LWR of 1.81 +/- 0.06 and 2.90 +/- 0.06 nm, respectively. Analogous high-resolution patterns were also observed in EBL with a sensitivity of 473 mu C/cm(2). Hence, the Ni-MOC-based resist investigated using HIBL and EBL elucidates the ability of its potential for the sub-10 nm technology node, under standard processing conditions.
Bye, fridends, I hope you can learn more about C8H8O2, If you have any questions, you can browse other blog as well. See you lster.. Recommanded Product: 3-Methylbenzoic acid
Reference:
Isothiazole – Wikipedia,
,Isothiazole – ScienceDirect.com